Epitaxy in Fe3Si/FeSi2 Superlattices Prepared by Facing Target Direct-Current Sputtering at Room Tempertaure
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概要
- 論文の詳細を見る
Fe3Si/FeSi2 superlattices were prepared on Si(111) at two deposition rates by facing target direct-current sputtering. For the deposition rates of 2.0 nm/min for Fe3Si and 1.3 nm/min for FeSi2, the Fe3Si layers were nonoriented. On the other hand, for half-deposition rates, the Fe3Si layers were epitaxially grown not only on Si(111) but also up to the top layer across the FeSi2 layers. The antiferromagnetic interlayer coupling between the Fe3Si layers was induced in the epitaxial superlattices, whereas it disappeared in the nonepitaxial superlattices. The regular accumulation of highly oriented Fe3Si layers is crucial for the interlayer coupling induction.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-12-15
著者
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Itakura Masaru
Department Of Applied Science For Electronics And Materials Kyushu University
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Tomokiyo Yoshitsugu
Department Of Applied Science For Electronics And Materials Kyushu University
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Kuwano Noriyuki
Department Of Applied Science For Electronics And Materials Interdisciplinary Graduate School Of Eng
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Yoshitake Tsuyoshi
Department Of Applied Science For Electronics And Materials Kyushu University
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Hara Daisuke
Department Of Applied Science For Electronics And Materials Kyushu University
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Takeda Kaoru
Department Of Applied Science For Electronics And Materials Kyushu University
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Kajiwara Toshinori
Department Of Electrical Engineering Faculty Of Engineering Fukuoka Institute Of Technology
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Ogawa Tetsuya
Department Of Applied Science For Electronics And Materials Kyushu University
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Nakagauchi Dai
Department Of Applied Science For Electronics And Materials Kyushu University
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Nagayama Kunihito
Department Of Aeronautics And Astronautics
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Yoshitake Tsuyoshi
Department of Applied Physics, Faculty of Engineering, Kyushu University
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Kajiwara Toshinori
Department of Electrical Engineering, Fukuoka Institute of Technology, Fukuoka 811-0295, Japan
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Kuwano Noriyuki
Department of Applied Science for Electronics and Materials, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
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Hara Daisuke
Department of Applied Science for Electronics and Materials, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
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Takeda Kaoru
Department of Applied Science for Electronics and Materials, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
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