Nakagauchi Dai | Department Of Applied Science For Electronics And Materials Kyushu University

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概要

• 同名の論文著者
• Department Of Applied Science For Electronics And Materials Kyushu Universityの論文著者

関連著者

• Yoshitake Tsuyoshi

  Department Of Applied Science For Electronics And Materials Kyushu University

• Nakagauchi Dai

  Department Of Applied Science For Electronics And Materials Kyushu University

• Nagayama Kunihito

  Department Of Aeronautics And Astronautics

• Yoshitake Tsuyoshi

  Department of Applied Physics, Faculty of Engineering, Kyushu University

• Itakura Masaru

  Department Of Applied Science For Electronics And Materials Kyushu University

• Tomokiyo Yoshitsugu

  Department Of Applied Science For Electronics And Materials Kyushu University

• Kuwano Noriyuki

  Department Of Applied Science For Electronics And Materials Interdisciplinary Graduate School Of Eng

• Nagayama Kunihito

  Department Of Aeronautics And Astronautics Kyushu University

• Hara Daisuke

  Department Of Applied Science For Electronics And Materials Kyushu University

• Takeda Kaoru

  Department Of Applied Science For Electronics And Materials Kyushu University

• Kajiwara Toshinori

  Department Of Electrical Engineering Faculty Of Engineering Fukuoka Institute Of Technology

• Ogawa Tetsuya

  Department Of Applied Science For Electronics And Materials Kyushu University

• Nakagauchi Dai

  Department of Applied Science for Electronics and Materials, Kyushu University, 6-1 Kasuga, Fukuoka

• Kajiwara Toshinori

  Department of Electrical Engineering, Fukuoka Institute of Technology, Fukuoka 811-0295, Japan

• Kuwano Noriyuki

  Department of Applied Science for Electronics and Materials, Kyushu University, Kasuga, Fukuoka 816-8580, Japan

• Hara Daisuke

  Department of Applied Science for Electronics and Materials, Kyushu University, Kasuga, Fukuoka 816-8580, Japan

• Takeda Kaoru

  Department of Applied Science for Electronics and Materials, Kyushu University, Kasuga, Fukuoka 816-8580, Japan

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著作論文

• Ferromagnetic Iron Silicide Thin Films Prepared by Pulsed-Laser Deposition
• Epitaxy in Fe3Si/FeSi2 Superlattices Prepared by Facing Target Direct-Current Sputtering at Room Tempertaure

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