Boron Diffusion Profiles in Ultrathin Silicon-on-Insulator Structures and Their Relation to Crystalline Quality
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-07-15
著者
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ICHIMURA Masaya
Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology
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ARAI Eisuke
Department of Electrical and Computer Engineering, Nagoya Institute of Technology
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Ichimura Masaya
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology
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UCIHDA Hideo
Department of Electrical and Computer Engineering, Nagoya Institute of Technology
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Ucihda Hideo
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology
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Uchida Hideo
Department Of Electrical Ad Computer Engineering Nagoya Institute Of Technology
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Arai Eisuke
Department Of Electrical Ad Computer Engineering Nagoya Institute Of Technology
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Ichimura Masaya
Department Of Electrical & Computer Engineering Nagoya Institute Of Technology
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