Photochemical Deposition of Patterned Gold Thin Films
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概要
- 論文の詳細を見る
We present a novel route for patterned gold thin-film deposition on glass substrates with the help of UV-light irradiation. Chloroauric acid (HAuCl4) is used as a source material and sodium sulfite (Na2SO3) acts as a reducing agent in an aqueous solution. Ethylene diamine (EDA) is added to increase the solution stability. The deposition solution is injected on the substrate. A patterned metal mask is placed 5 mm above the substrate, and the solution is illuminated for 15 min by an ultrahigh-pressure mercury arc lamp. A patterned Au film with a thickness of 0.1–0.2 μm is deposited.
- Japan Society of Applied Physicsの論文
- 2006-12-25
著者
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Ichimura Masaya
Department Of Engineering Physics Electronics And Mechanics Nagoya Institute Of Technology
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MIYAWAKI Tetsuya
Department of Materials Science, Tohoku University
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Kumaran Abbu
Department Of Engineering Physics Electronics And Mechanics Nagoya Institute Of Technology
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Ichimura Masaya
Department Of Electrical & Computer Engineering Nagoya Institute Of Technology
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Miyawaki Tetsuya
Department Of Engineering Physics Electronics And Mechanics Nagoya Institute Of Technology
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Miyawaki Tetsuya
Department of Electrical and Electronic Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya, Aichi 466-8555, Japan
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