Electrochemical Deposition of ZnO1-xSx Thin Films Using Three-Step Pulse
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概要
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ZnO1-xSx thin films with $0\leq x \leq 0.5$ were deposited by electrochemical deposition from acidic solutions containing ZnCl2 and Na2S2O3 of different concentrations. The as-deposited films are of thicknesses around 0.5 μm. We used a new pulse form for deposition, i.e., the three-step pulse. The sulfur content increases with increasing concentration of Na2S2O3 at low concentration range. Further increase in Na2S2O3 concentration results in decrease in the sulfur content due to the formation of the sulfur colloids. A decrease in the bandgap energy with increasing sulfur content $x$ was obtained. The bandgap bowing parameter was found to be about 4 eV.
- Japan Society of Applied Physicsの論文
- 2005-10-10
著者
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Ichimura Masaya
Nagoya Inst. Technol. Nagoya Jpn
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Ichimura Masaya
Department Of Electrical Ad Computer Engineering Nagoya Institute Of Technology
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Fathy Naglaa
Department of Engineering, Physics, Electronics and Mechanics, Nagoya Institute of Technology, Gokis
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Fathy Naglaa
Department Of Engineering Physics Electronics And Mechanics Nagoya Institute Of Technology
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Ichimura Masaya
Department Of Electrical & Computer Engineering Nagoya Institute Of Technology
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