Characterization of Si wafer Surfaces after Wet Chemical Treatment by the Microwave Reflectance Photconductivity Decay Method with Surface Electric Field
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2001-05-01
著者
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ICHIMURA Masaya
Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology
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Hirano M
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology
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TADA Atsushi
Department of Electrical and Computer Engineering, Nagoya Institute of Technology
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HIRANO Masashi
Department of Electrical and Computer Engineering, Nagoya Institute of Technology
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ARAI Eisuke
Department of Electrical and Computer Engineering, Nagoya Institute of Technology
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TAKAMATSU Hiroyuki
Process Technology Research Laboratory, Kobe Steel, Ltd
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SUMIE Shingo
Process Technology Research Laboratory, Kobe Steel, Ltd
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