Electrochemical Etching of 6H-SiC Using Aqueous KOH Solutions with Low Surface Roughness

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-07-15

著者

• KATO Masashi

  Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology

• ICHIMURA Masaya

  Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology

• ARAI Eisuke

  Department of Electrical and Computer Engineering, Nagoya Institute of Technology

• Kato M

  Japan Atomic Energy Res. Inst. Ibaraki Jpn

• RAMASAMY Perumalsamy

  Crystal Growth Centre, Anna University

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