Chemical Vapor Deposition of Single-Crystalline ZnO Film with Smooth Surface on Intermediately Sputtered ZnO Thin Film on Sapphire
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概要
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A very thin ZnO sputtered layer is newly introduced as an intermediate layer to obtain a smooth surface of ZnO film epitaxially grown on a sapphire substrate by the CVD method. By a ZnO-H_2-H_2O-O_2 CVD system, a(0001) ZnO film is grown on a (0001) sapphire substrate, while a (1120) ZnO film is grown on a (1102) sapphire substrate. The surfaces of asgrown ZnO films are so smooth that a light beam can easily couple and propagate into a wave-guide of the ZnO film.
- 社団法人応用物理学会の論文
- 1978-05-05
著者
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Shiosaki Tadashi
Department Of Electrical Engineering Ii Faculty Of Engineering Kyoto University
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OHNISHI Shinzo
Department of Electronics, Faculty of Engineering, Kyoto University
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HIROKAWA Yuji
Department of Electronics, Faculty of Engineering, Kyoto University
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Hirokawa Yuji
Department Of Electronics Faculty Of Engineering Kyoto University
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Ohnishi Shinzo
Department Of Electronics Faculty Of Engineering Kyoto University
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