Electrical Properties of LiNbO_3 Thin Films by RF Magnetron Sputtering and Bias Sputtering
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-09-30
著者
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堀内 敏行
東京電機大学工学部
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SHIMIZU Masaru
Department of Electrical Engineering and Computer Sciences, Graduate School of Engineering, Universi
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松重 和美
Dep. Of Electronic Sci. And Engineering Kyoto Univ. Katsura Nishikyo Kyoto 615-8510 Japaninnovative
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Nishida Takashi
Department of Biochemistry and Molecular Dentistry, Okayama University Graduate School of Medicine a
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Nishida T
Ntt Basic Res. Lab. Kanagawa Jpn
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Nishida T
Nara Inst. Sci. And Technol. Nara Jpn
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MATSUSHIGE Kazumi
Department of Electronic Science and Engineering, Kyoto University
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HORIUCHI Toshihisa
Department of Electric Science and Engineering, Graduated School of Kyoto University
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Shiosaki Tadashi
Department of Electronic, Faculty of Engineering, Kyoto University
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Shimizu M
Advanced Industrial Science And Technology (aist) Power Electronics Research Center
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Shimizu Mitsuaki
Power Electronics Research Center National Institute Of Advanced Industrial Science And Technology
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Nishida T
Nara Inst. Sci. And Technol. (naist) Nara Jpn
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Nishida T
Ntt Basic Research Laboratories
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Nishida Toshio
Ntt Basic Research Laboratories Physical Science Laboratory
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Matsushige Kazumi
Department Of Applied Science Faculty Of Engineering Kyushu University
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Shiosaki Tadashi
Research Development Division Sakai Chemical Industry Co. Ltd.
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Nishida Takashi
Department Of Biochemistry And Molecular Dentistry Okayama University Graduate School Of Medicine An
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Shiosaki Tadashi
Department Of Electrical Engineering Ii Faculty Of Engineering Kyoto University
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Horiuchi Toshihisa
Department Of Applied Physics Faculty Of Engineering Kyushu University
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Shimizu Masaru
Department Of Chemical Engineering Tokyo University Of Agriculture And Technology
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Tokuhisa Hiroaki
Department Of Materials Science And Technology Graduate School Of Engineering Sciences Kyushu Univer
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Shimizu Masaru
Department Of Chemical Engineering Faculty Of Engineering Tokyo University Of Agriculture And Techno
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