Effects of photo- and Auger Electron Scattering on Resolution and Linewidth Control in SR Lithography : Lithography Technology
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-01-31
著者
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堀内 敏行
東京電機大学工学部
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Yoshikawa Akira
Ntt Lsi Laboratories
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ISHIYAMA Toshihiko
NTT LSI Laboratories
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Ishiyama Toshihiko
Ntt Integrated Information & Energy Systems Laboratories
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DEGUHI Kiniyoshi
NTT LSI Laboratories
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HORIUCHI Toshiyuki
NTT LSI Laboratories
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Ishiyama T
Ntt Telecommunications Energy Lab. Tokyo Jpn
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Deguchi K
Department Of Electronics And Information Systems Osaka University
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Tokuhisa Hiroaki
Department Of Materials Science And Technology Graduate School Of Engineering Sciences Kyushu Univer
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