Resolution Improvement Using Auxiliary Pattern Groups in Oblique Illumination Lithography
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概要
- 論文の詳細を見る
In this paper we present a new resolution improvement technique for nonperiodic patterns where oblique illumination effects are limited. Since the problems are caused by nonperiodicity, a technique called auxiliary pattern group (APG) is introduced to supplement the periodicity. The effects of the APG are shown by simulation, and parameter dependence is also discussed. Experimental results for oblique illumination with a t-π mask confirm that using APGs improves the resolution and focus latitude.
- 社団法人応用物理学会の論文
- 1993-12-30
著者
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堀内 敏行
東京電機大学工学部
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HORIUCHI Toshiyuki
NTT LSI Laboratories
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HARADA Katsuhiro
NTT LSI Laboratories
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Tamechika Emi
NTT LSI Laboratories
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Tokuhisa Hiroaki
Department Of Materials Science And Technology Graduate School Of Engineering Sciences Kyushu Univer
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