Performance of Single Sideband Optical Lithography Using a Pupil Filter in Replicating Isolated Patterns

概要

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This paper describes how oblique illumination optical lithography using a transmittance-adjusted pupil filter is efficient for isolated patterns as well as periodical patterns. This method is successful for the following reasons. When a pupil filter has a small transmittance in the area where Oth-order diffraction light image of secondary light source is made, the Oth-order diffraction light is selectively attenuated. From this attenuation, the ratio of the light components with a middle and high spatial frequency becomes larger than it would without a pupil filter. As aresult, because the light intensity curves for isolated line patterns and space patterns are sharpened, high resolution and large focus latitude are obtained. Lines-and-spaces patterns and both types of isolated patterns with a critical size near the resolution limit are replicated into the designed width simultaneously with the same exposure dose.
社団法人応用物理学会の論文
1994-12-30