Overlay Accuracy Evaluation in Step-and-Repeat X-Ray Lithography : Semiconductors and Semiconductor Devices
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1988-07-20
著者
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Hirata Kazuo
Ntt Lsi Laboratories
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HORIUCHI Toshiyuki
NTT LSI Laboratories
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DEGUCHI Kimiyoshi
NTT LSI Laboratories
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Komatsu Kazuhiko
Ntt Lsi Laboratories
関連論文
- Effects of photo- and Auger Electron Scattering on Resolution and Linewidth Control in SR Lithography : Lithography Technology
- Effects of Photo- and Auger Electron Scattering on Resolution and Linewidth Control in SR Lithography
- Optical Image Simulator Using the Real-Space Expression of the Object Pattern and a Differential Operator for Optical Proximity Effect Estimation
- Resolution Enhancement by Oblique Illumination Optical Lithography Using a Transmittance-Adjusted Pupil Filter
- Patterning Characteristics of Oblique Illumination Optical Lithography
- Overlay Accuracy Evaluation in Step-and-Repeat X-Ray Lithography : Semiconductors and Semiconductor Devices
- A 0.25-μm BiCMOS Technology Using SOR X-Ray Lithography (Special Issue on Quarter Micron Si Device and Process Technologies)
- Enhancement of the Annular Illumination Effect Using a Printing Process Resolvable with Low Image Contrast
- Effect of Mechanical Vibration on Patterning Characteristics in Synchrotron Radiation Lithography
- Resolution Improvement Using Auxiliary Pattern Groups in Oblique Illumination Lithography
- Effect of Acid Diffusion on Resolution of a Chemically Amplified Resist in X-Ray Lithography
- Alkali-Developable Silicone-Based Negative Photoresist (SNP) for Deep UV, Electron Beam, and X-Ray Lithographies
- Effects of Synchrotron X-Ray Irradiation on Hot Carrier Reliability in Subquarter-Micrometer NMOSFETs (Special Issue on Sub-Half Micron Si Device and Process Technologies)
- X-Ray Phase-Shifting Mask for 0.1-μm Pattern Replication under a Large Proximity Gap Condition
- Patterning Characteristics of a Chemically-Amplified Negative Resist in Synchrotron Radiation Lithography
- Effects of Fresnel Diffraction on Resolution and Linewidth Control in Synchrotron Radiation Lithography
- Patterning Characteristics of 0.1-μm Line-and-Space Patternin Synchrotron Radiation Lithography
- Proximity Effect on Patterning Characteristics of Hole Patterns in Synchrotron Radiation Lithography
- Performance of Single Sideband Optical Lithography Using a Pupil Filter in Replicating Isolated Patterns
- Influence of Pattern Displacement Error Caused by Film Deposition on Overlay Accuracy in LSI Fabrication
- Ultra-Fine Pattern Fabrication by Synchrotron Radiation X-Ray Lithography Using a Shifter-Edge Type Phase-Shifting Mask