DEGUCHI Kimiyoshi | NTT LSI Laboratories

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概要

• 同名の論文著者
• NTT LSI Laboratoriesの論文著者

関連著者

• DEGUCHI Kimiyoshi

  NTT LSI Laboratories

• Deguchi K

  Department Of Electronics And Information Systems Osaka University

• HORIUCHI Toshiyuki

  NTT LSI Laboratories

• Miyoshi K

  Ulsi Device Development Laboratory Nec Corporation

• MIYOSHI Kazunori

  NTT LSI Laboratories

• MATSUDA Tadahito

  NTT LSI Laboratories

• SOMEMURA Yoh

  NTT LSI Laboratories

• MATSUDA Tadahito

  NTT System Electronics Laboratories

• Ban H

  Ntt Advanced Technol. Corp. Atsugi‐shi Jpn

• Tanaka A

  Department Of Applied Science For Electronics And Materials Graduate School Of Engineering Science

• Somemura Y

  Ntt Lsi Laboratories

• TANAKA Akinobu

  NTT LSI Laboratories

• Ban Hiroshi

  NTT LSI Laboratories

• Matsuda T

  Ntt Telecommunications Energy Laboratories

• Matsuda T

  Tokyo Inst. Technol. Tokyo Jpn

• 堀内 敏行

  東京電機大学工学部

• HAGA Tetsuya

  Department of Applied Physics, Hokkaido University

• OHKI Shigehisa

  NTT LSI Laboratories

• Haga T

  Ntt Telecommunications Energy Lab. Kanagawa Jpn

• Yoshikawa Akira

  Ntt Lsi Laboratories

• KAWAI Yoshio

  NTT LSI Laboratories

• Suzuki M

  Shizuoka Univ. Hamamatsu

• Hirata Kazuo

  Ntt Lsi Laboratories

• Suzuki M

  Department Of Electronic Engineering Faculty Of Engineering Hokkaido University

• Suzuki Mitsuru

  Cryogenic Centre University Of Tokyo

• Konaka Shinsuke

  Ntt Lsi Laboratories

• ISHIYAMA Toshihiko

  NTT LSI Laboratories

• FUKUDA Makoto

  NTT Telecommunications Energy Laboratories

• NAKAMURA Jiro

  NTT Telecommunications Energy Laboratories

• Suzuki M

  Sci. Univ. Tokyo Chiba Jpn

• Suzuki M

  Research Center Asahi Glass Co. Ltd.

• Nakamura Junko

  Central Research Laboratory Hitachi Ltd.

• Ishiyama Toshihiko

  Ntt Integrated Information & Energy Systems Laboratories

• Suzuki Mariko

  Advanced Semiconductor Devices Research Laboratories R&d Center Toshiba Corporation

• Fukuda M

  Chitose Inst. Sci. And Technol. Hokkaido Jpn

• 河合 良信

  Kyushu Univ. Fukuoka

• Nakamura J

  Hokkaido Univ. Sapporo Jpn

• Komatsu Kazuhiko

  Ntt Lsi Laboratories

• Nakamura Jiro

  NTT LSI Laboratories

• Suzuki M

  Department Of Electronics Graduate School Of Engineering Tohoku University

• Ishii Tetsuyoshi

  Ntt Lsi Laboratories

• Ishiyama T

  Ntt Telecommunications Energy Lab. Tokyo Jpn

• TSUCHIYA Toshiaki

  NTT LSI Laboratories

• Kobayashi Toshio

  NTT LSI Laboratories

• Yamamoto Eiichi

  NTT LSI Laboratories

• Yamamoto Yousuke

  NTT LSI Laboratories

• Yamamoto E

  Ntt Lsi Laboratories

• Harada Mitsuru

  Ntt Lsi Laboratories

• FUKUDA Makoto

  NTT LSI Laboratories

• ENDO Naoe

  NTT LSI Laboratories

• TSUYUZAKI Haruo

  NTT LSI Laboratories

• SUZUKI Masanori

  NTT LSI Laboratories

• Tsuyuzaki H

  Ntt Lsi Laboratories

• Tokuhisa Hiroaki

  Department Of Materials Science And Technology Graduate School Of Engineering Sciences Kyushu Univer

• S0MEMURA Yoh

  NTT LSI Laboratories

• Nakamura Junichi

  Department Of Electronics Faculty Of Engineering Himeji Institute Of Technology

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著作論文

• Effects of Photo- and Auger Electron Scattering on Resolution and Linewidth Control in SR Lithography
• Overlay Accuracy Evaluation in Step-and-Repeat X-Ray Lithography : Semiconductors and Semiconductor Devices
• A 0.25-μm BiCMOS Technology Using SOR X-Ray Lithography (Special Issue on Quarter Micron Si Device and Process Technologies)
• Effect of Mechanical Vibration on Patterning Characteristics in Synchrotron Radiation Lithography
• Effect of Acid Diffusion on Resolution of a Chemically Amplified Resist in X-Ray Lithography
• Alkali-Developable Silicone-Based Negative Photoresist (SNP) for Deep UV, Electron Beam, and X-Ray Lithographies
• Effects of Synchrotron X-Ray Irradiation on Hot Carrier Reliability in Subquarter-Micrometer NMOSFETs (Special Issue on Sub-Half Micron Si Device and Process Technologies)
• X-Ray Phase-Shifting Mask for 0.1-μm Pattern Replication under a Large Proximity Gap Condition
• Patterning Characteristics of a Chemically-Amplified Negative Resist in Synchrotron Radiation Lithography
• Effects of Fresnel Diffraction on Resolution and Linewidth Control in Synchrotron Radiation Lithography
• Patterning Characteristics of 0.1-μm Line-and-Space Patternin Synchrotron Radiation Lithography
• Proximity Effect on Patterning Characteristics of Hole Patterns in Synchrotron Radiation Lithography
• Influence of Pattern Displacement Error Caused by Film Deposition on Overlay Accuracy in LSI Fabrication
• Ultra-Fine Pattern Fabrication by Synchrotron Radiation X-Ray Lithography Using a Shifter-Edge Type Phase-Shifting Mask

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