KAWAI Yoshio | NTT LSI Laboratories

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著作論文

ArF Excimer Laser Projection Lithography Using Partially Achromatized Lens System : Lithography Technology
ArF Excimer Laser Projection Lithography Using Partially Achromatized Lens System
Spatial Frequency Doubling Method by Image Superimposition for Sub-0.15-μm Optical Lithography
Spatial Frequency Doubling Method for Sub-0.15-μm Optical Lithography
Effect of Overcoats in Chemically Amplified Resists against Water and Organic Bases
The Effect of an Organic Base in Chemically Amplified Resist on Patterning Characteristics Using KrF Lithography
Metal-Free Acid Generators for Chemically Amplified Monodispersal Polyhydroxystyrene-Based Positive Resist and Post-Exposure Delay Problem
Image Reversal Characteristics of a Novel Silicone-Based Positive Photoresist (SPP) in Near UV Lithography : Resist Material and Process
Hole Pattern Fabrication using Halftone Phase-Shifting Masks in KrF Lithography
Characteristics of a Monodisperse PHS-Based Positive Resist (MDPR) in KrF Excimer Laser Lithography
Characteristics of an Chemically Amplified Silicone-Based Negative Resist (CSNR) in Electron Beam Lithography
Alkali-Developable Silicone-Based Negative Photoresist (SNP) for Deep UV, Electron Beam, and X-Ray Lithographies
Imaging in an Optical Projection System with a Laser Light Source. I : Gaussian Laser Light Illumination
Image Reversal Characteristics of a Novel Silicone-Based Positive Photoresist (SPP) in Near UV Lithography

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