Image Reversal Characteristics of a Novel Silicone-Based Positive Photoresist (SPP) in Near UV Lithography
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概要
- 論文の詳細を見る
The image reversal characteristics of SPP, which is composed of an alkali-soluble silicone polymer (APSQ) and a diazonaphthoquinone photosensitizer, have been studied. The mechanism of SPP image reversal in near UV lithography is the acid-catalyzed condensation of the silanol groups in the APSQ during postexposure baking. SPP is a dual-mode resist which can accommodate both a standard positive resist process and an image reversal process in near UV lithography. The sensitivity is much higher in the latter process.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1989-10-20
著者
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KAWAI Yoshio
NTT LSI Laboratories
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TANAKA Akinobu
NTT LSI Laboratories
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Ban Hiroshi
NTT LSI Laboratories
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Kawai Yoshio
NTT LSI Laboratories, Morinosato, Atsugi-shi, Kanagawa, 243-01
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