Image Reversal Characteristics of a Novel Silicone-Based Positive Photoresist (SPP) in Near UV Lithography : Resist Material and Process
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1989-12-30
著者
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KAWAI Yoshio
NTT LSI Laboratories
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TANAKA Akinobu
NTT LSI Laboratories
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BAN Hitoshi
NTT LSI Laboratories
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