Alkali-Developable Silicone-Based Positive Resist for Electron Beam Lithography : Techniques, Instrumentations and Measurement
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概要
- 論文の詳細を見る
Silicone-based positive electron beam resist (SPR) developable with alkaline aqueous solution is first reported. SPR is composed of acetylated polyphenylsilsesquioxwne and poly(methylpentene sulfone) as a dissolution inhibitor. Resist sensitivity of SPR reaches up to 5 μC/cm^2 for 20 kV electron beam exposure. A two-layer resist system of SPR and a hard baked novolak resin reveals good performance for 0.8 μm pitch line and space pattern fabrication.
- 社団法人応用物理学会の論文
- 1988-11-20
著者
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Imamura Saburo
Ntt Basic Research Laboratories
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TANAKA Akinobu
NTT LSI Laboratories
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Ban Hirochi
Ntt Lsi Laboratories
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