Low-Temperature Deposition of Silicon Dioxide Films by Photoinduced Decomposition of Tetraethoxysilane
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1989-07-20
著者
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Niwano Michio
Research Institute of Electrical Communication (RIEC), Tohoku University
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Niwano M
Tohoku Univ. Sendai Jpn
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Suemitsu M
Tohoku Univ. Sendai Jpn
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Suemitsu Maki
Research Institute Of Electrical Communication Tohoku University
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MIYAMOTO Nobuo
Research Institute of Electrical Communication, Tohoku University
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HIRANO Satoshi
Research Institute of Electrical Communication, Tohoku University
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HONMA Koji
Chemitronics Co., Ltd.
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Miyamoto N
Spring-8 Service Co. Ltd.
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Niwano M
Research Institute Of Electrical Communication Tohoku University
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Niwano Michio
Research Institute Of Electrical Communication (riec) Tohoku University
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Honma Koji
Chemitronics Co. Ltd.
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Miyamoto Nobuo
Research Development Corporation Of Japan (jrdc)
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Hirano Satoshi
Research Institute Of Electrical Communication Tohoku University
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MIYAMOTO Naokazu
SPring-8 Service Co., Ltd.
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Suemitsu Maki
Research Institute of Electrical Communication (RIEC), Tohoku University, Sendai 980-8577, Japan
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