Miyamoto Nobuo | Research Development Corporation Of Japan (jrdc)

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著作論文

Interdiffusion of Si and Ge Atoms during Gas-Source MBE of Ge on Si(100) at 500-800℃
Behavior of Excess Arsenic in Undoped, Semi-Insulating GaAs during Ingot Annealing
Low-Temperature Deposition of Silicon Dioxide Films by Photoinduced Decomposition of Tetraethoxysilane
Effects of Refraction of X-Rays in Double-Crystal Topography : Techniques, Instrumentations and Measurement
EPR Study on Cr^ Distribution in LEC GaAs: Cr Wafers
Surface Hydrogen Desorption as a Rate-Limiting Process in Silane Gas-Source Molecular Beam Epitaxy
High Quality Silicon Epitaxy at 500℃ using Silane Gas-Source Molecular Beam Technique
In Situ Observation of Photon-Stimulated Hydrogen Removal on a HF-Passivated Si(111) Surface by Ultraviolet Photoelectron Spectroscopy Using Synchrotron Radiation
Low-Temperature Cleaning of HF-Passivated Si(111) Surface with VUV Light
Examination of Surface-Roughness of Silicon Crystals by Double-Crystal X-Ray Topography
Enhancement and Suppression Effect of Carbon Atoms on Oxygen Aggregation and New Donor Formation in Silicon Crystals Preannealed at Low Temperatures
Lattice Strain of Selectively Grown Silicon Epitaxial Layer
A Quantum Flux Parametron (QFP) 12-Bit Shift Register Capable of Stable Microwave Frequency Operation
Two-Dimensional Growth and Decomposition of Initial Thermal SiO_2 Layer on Si(100)
Outdiffusion and Subsequent Desorption of Volatile SiO Molecules during Annealing of Thick SiO_2 Films in Vacuum
Anomalous Diffusion of Phosphorus into Silicon
Photon-Stimulated Desorption of H+ Ions from Oxidized Si(111) Surfaces
Low Temperature Silicon Surface Cleaning by HF Etching/Ultraviolet Ozone Cleaning (HF/UVOC) Method (I)—Optimization of the HF Treatment—
Low Temperature Silicon Surface Cleaning by HF Etching/Ultraviolet Ozone Cleaning (HF/UVOC) Method (II)—in situ UVOC

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