HIROSE Fumihiko | Research Institute of Electrical Communication, Tohoku University
スポンサーリンク
概要
関連著者
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Suemitsu M
Tohoku Univ. Sendai Jpn
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Suemitsu Maki
Research Institute Of Electrical Communication Tohoku University
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MIYAMOTO Nobuo
Research Institute of Electrical Communication, Tohoku University
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HIROSE Fumihiko
Research Institute of Electrical Communication, Tohoku University
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HIROSE Fusao
Nippondenso Research Laboratories
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Miyamoto N
Spring-8 Service Co. Ltd.
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Miyamoto Nobuo
Research Development Corporation Of Japan (jrdc)
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Hirose F
Mitsubishi Heavy Ind. Ltd. Yokohama Jpn
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MIYAMOTO Naokazu
SPring-8 Service Co., Ltd.
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Suemitsu Maki
Research Institute of Electrical Communication (RIEC), Tohoku University, Sendai 980-8577, Japan
著作論文
- Surface Hydrogen Desorption as a Rate-Limiting Process in Silane Gas-Source Molecular Beam Epitaxy
- High Quality Silicon Epitaxy at 500℃ using Silane Gas-Source Molecular Beam Technique