Plasma oxidation process of silicon surfaces investigated by infrared spectroscopy
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概要
- 論文の詳細を見る
- 2003-12-16
著者
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Kimura Yasuo
Research Institute of Electrical Communication (RIEC), Tohoku University
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Niwano Michio
Research Institute of Electrical Communication (RIEC), Tohoku University
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Niwano Michio
Research Institute Of Electrical Communication Tohoku University
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SHINOHARA Masanori
Department of Oral and Maxillofacial Surgery, Sensory and Motor Organ Sciences, Faculty of Medical a
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Kimura Yasuo
Research Institute Of Electrical Communication Tohoku University
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Niwano M
Research Institute Of Electrical Communication Tohoku University
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Niwano Michio
Research Institute Of Electrical Communication (riec) Tohoku University
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FUJIYAMA Hiroshi
Department of Energy Conversion, Graduate School of Engineering Sciences, Kyushu University
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Shinohara M
Department Of Electrical And Electronic Engineering Nagasaki University
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KATAGIRI Teruaki
Department of Electrical and Electronic Engineering, Nagasaki University
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IWATSUJI Keitaro
Department of Electrical and Electronic Engineering, Nagasaki University
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MATSUDA Yoshinobu
Department of Electrical and Electronic Engineering, Nagasaki University
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Kimura Yasuo
Research Institute Of Electrical Communication (riec) Tohoku University
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Katagiri Teruaki
Department Of Electrical And Electronic Engineering Nagasaki University
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Iwatsuji Keitaro
Department Of Electrical And Electronic Engineering Nagasaki University
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Fujiyama Hiroshi
Department Of Electrical And Electronic Engineering Nagasaki University
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Matsuda Yoshinobu
Department Of Electrical And Electronic Engineering Nagasaki University
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Shinohara Masanori
Department Of Dentistry And Oral Surgery Kumamoto University School Of Medicine
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