Relation between Plasma Parameters and Film Properties in DC Reactive Magnetron Sputtering of Indium-Tin-Oxide
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概要
- 論文の詳細を見る
The dc magnetron sputtering process of an indium-tin-oxide (ITO) target in Ar/O2 is studied. Experimental results from laser induced fluorescence measurements of sputtered indium atoms, optical emission measurements of various atomic and molecular species in the excited states, probe measurements of plasma ion density and potential, and measurements of deposited film properties (transmittance, resistivity and deposition rate) are reported. Effects of the preset pressure of introduced O2 on these parameters are investigated over a wide range of preset pressures.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1997-07-30
著者
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Fujiyama Hiroshi
Department Of Electrical And Electronic Engineering Nagasaki University
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Matsuda Yoshinobu
Department Of Electrical And Electronic Engineering Nagasaki University
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Fujiyama Hiroshi
Department of Electrical Engineering and Computer Science, Nagasaki University, 1-14 Bunkyo, Nagasaki 852, Japan
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Yamori Yasunari
Department of Electrical Engineering and Computer Science, Nagasaki University, 1-14 Bunkyo, Nagasaki 852, Japan
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Ohgushi Shinichi
Department of Electrical Engineering and Computer Science, Nagasaki University, 1-14 Bunkyo, Nagasaki 852, Japan
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Muta Madoka
Department of Electrical Engineering and Computer Science, Nagasaki University, 1-14 Bunkyo, Nagasaki 852, Japan
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