Structural and Electrical Properties of Ta_2O_5 Grown by the Plasma-Enhanced Liquid Source CVD Using Penta Ethoxy Tantalum Source
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-01-30
著者
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Fujita S
Kyoto Univ. Kyoto Jpn
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Fujita Shizuo
Department Of Electronic Science And Engineering Kyoto University
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Fujita S
Department Of Electronic Science And Engineering Kyoto University
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FUJITA Shigeo
Department of Electrical Engineering Kyoto University
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Fujita S
Hachinohe Inst. Technol. Aomori Jpn
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Fujita Shigeo
Department Of Applied Physics And Physico-informatics Keio University
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MURAWALA Prakash
Research & Development Center, Samco International Incorporated
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SAWAI Mikio
Research & Development Center, Samco International Incorporated
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TATSUTA Toshiaki
Research & Development Center, Samco International Incorporated
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TSUJI Osamu
Research & Development Center, Samco International Incorporated
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Sawai Mikio
Research & Development Center Samco International Inc
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Murawala P
Research & Development Center Samco International Incorporated
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Tsuji O
Samco International Co. Ltd.
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Fujita Shizuo
Department Of Electrical Engineering Kyoto University
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Tsuji O
Samco International Inc. Kyoto Jpn
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Tatsuta T
Samco International Co. Ltd.
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