Plasma-Deposited Silicon Nitride Films from SiF_2 as Silicon Source
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1984-05-20
著者
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Fujita Shizuo
Department Of Electronic Science And Engineering Kyoto University
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TOYOSHIMA Hideo
Department of Internal Medicine (Endocrinology and Metabolism), Graduate School of Comprehensive Hum
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Fujita S
Department Of Electronic Science And Engineering Kyoto University
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Fujita S
Hachinohe Inst. Technol. Aomori Jpn
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Sasaki A
Shizuoka Univ. Hamamatsu Jpn
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SASAKI Akio
Department of Electrical Engineering, Kyoto University
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OHISHI Toshiyuki
Central Research Laboratory, Mitsubishi Electric Corporation
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Toyoshima Hideo
Department Of Electrical Engineering Kyoto University
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Sasaki A
Facuty Of Engineering Shizuoka Univeisty
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OHISHI Toshiyuki
Department of Electrical Engineering, Kyoto University
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TOYOSHIMA Hideo
NEC Corporation, Microelectronics Research Laboratories
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Toyoshima H
Nec Corp. Kanagawa Jpn
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Sasaki Akio
Department Of Electrical Engineering Kyoto University
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Fujita Shizuo
Department Of Electrical Engineering Kyoto University
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