OMVPE Growth and Characterization of GaInP on GaAs Using Tertiary Butylphosphine for the Phosphorous Source
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1990-07-20
著者
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Takeda Yoshikazu
Department Of Electrical Engineering Kyoto University:(present Address) Department Of Materials Nago
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Takeda Yoshikazu
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Takeda Y
Department Of Chemistry Faculty Of Engineering Mie University
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Takeda Y
Nagoya Univ. Nagoya Jpn
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Sasaki A
Shizuoka Univ. Hamamatsu Jpn
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SASAKI Akio
Department of Electrical Engineering, Kyoto University
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Takeda Yasuo
Department Of Chemistry Faculty Of Engineering Mie Univerisity
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NODA Susumu
Department of Electrical Engineering, Kyoto University
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ARAKI Soichiro
Department of Electrical Engineering, Kyoto University
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TAKEMI Masayoshi
Department of Electrical Engineering, Kyoto University
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Noda Susumu
Department Of Electrical Engineering Kyoto University
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Sasaki Akio
Department Of Electrical Engineering Kyoto University
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Takemi Masayoshi
Department Of Electrical Engineering Kyoto University
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Noda Susumu
Department of Electric Science and Engineering, Kyoto University
関連論文
- Super-High Brightness and High-Spin-Polarization Photocathode
- Epitaxial Growth of NdFeAsO Thin Films by Molecular Beam Epitaxy
- Effect of Ln-Site Disorder on T_c of Oxypnictide Superconductor LnFeAsO_F_x (Ln = Nd, Ce-Gd, and La-Dy)
- Nanoscale ErP Islands on InP(001) Substrate Grown by Organometallic Vapor-Phase Epitaxy
- Thermal Quenching of Er-Related Luminescence in GaInP Doped with Er by Organometallic Vapor Phase Epitaxy
- Formation of ErP Islands on InP(001) Surface by Organometallic Vapor Phase Epitaxy
- Effects of Growth Temperature on Er-Related Photoluminescence in Er-Doped InP and GaAs Grown by Organometallic Vapor Phase Epitaxy with Tertiarybutylphosphine and Tertiarybutylarsine
- Droplet Hetero-Epitaxy of InAs Quantum Structures on InP Nanopyramids Formed by Selective-Area Flow Rate Modulation Epitaxy
- Fabrication of InP Submicron Pillars for Two-Dimensional Photonic Crystals by Reactive Ion Etching
- Fabrication of Two-Dimensional InP Photonic Band-Gap Crystals by Reactive Ion Etching with Inductively Coupled Plasma