A 6.93-μm^2 Full CMOS SRAM Cell Technology for 1.8-V High-Performance Cache Memory
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概要
- 論文の詳細を見る
A high-performance microprocessor-compatible small size full CMOS SRAM cell technology for under 1.8-V operation has been developed. Less than 1-μm spacing between the n and pMOSFETs is achieved by using a retrograde well combined with SSS-OSELO technology. To connect the gates of a driver nMOSFET and a load pMOSFET directly, a 0.3-μm n-gate load pMOSFET, formed by amorphous-Si-film through-channel implantation, is merged with a 0.25-μm p-gate pMOSFET for the peripheral circuits. The memory cell area is reduced by using a mask-free contact process for the local interconnect, which includes titanium-nitride wet-etching using a plasma-TEOS silicone-dioxide mask. The newly developed memory cell was demonstrated using 0.25-μm CMOS process technology. A 6.93-μm^2 and 1-V operation full CMOS SRAM cell with a high-performance circuit was achieved by a simple fabrication process.
- 社団法人電子情報通信学会の論文
- 1997-04-25
著者
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Kure T
Hitachi Ltd. Tokyo Jpn
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Kure Tokuo
Hitachi Central Research Laboratory
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Nishida Takashi
Central Research Laboratory Hitachi Ltd.
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YAMANAKA Toshiaki
Central Research Laboratory, Hitachi, Ltd.
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MINAMI Masataka
Semiconductor and Integrated Circuits Division, Hitachi, Ltd.
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OHKI Nagatoshi
Hitachi ULSI Engineering Corp.
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ISHIDA Hiroshi
Hitachi ULSI Engineering Corp.
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SHIMIZU Akihiro
Hitachi ULSI Engineering Corp.
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ISHIBASHI Koichiro
Central Research Laboratory, Hitachi, Ltd.
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SATOH Akira
Hitachi ULSI Engineering Corp.
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NISHIDA Takashi
Semiconductor and Integrated Circuits Division, Hitachi, Ltd.
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NAGANO Takahiro
Semiconductor and Integrated Circuits Division, Hitachi, Ltd.
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Kure Tokuo
Hitachi Ulsi Engineering Corp.
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Yamanaka Toshio
The Graduate School Of Advanced Sciences Of Matter Hiroshima University:texas Instruments Japan Limi
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Yamanaka T
Renesas Device Design
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Nagano Tomohiro
Department Of Physics Faculty Of Sciense And Technology Science University Of Tokyo
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Shimizu A
Kochi Univ. Technol. Kochi‐ken Jpn
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Shimizu A
Hitachi Ulsi Engineering Corp.
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Shimizu Akihiro
東京工業高等専門学校
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Minami Masataka
Semiconductor And Integrated Circuits Division Hitachi Ltd.
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SHIMIZU Akihiro
Kochi University of Technology
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Yamanaka Toshiaki
Central Research Laboratory Hitachi Ltd.
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Ishibashi K
Riken Wako‐shi Jpn
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Ishibashi Koichiro
Central Research Laboratory Hitachi Ltd.
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Nagano Takahiro
Semiconductor And Integrated Circuits Division Hitachi Ltd.
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