428 ドライエッチングした結晶Si壁面の平坦化と光応用(光メカトロニクスI)(OS.6 ナノ構造創成をめざす光メカトロニクスの展開)

概要

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A new method for smoothening the dry etched surface is described for using the surface as the mirror in the optical application of the microstructure. Dry etching is frequently used to form the main shape, and subsequent anisotropic etching is applied for a short time to smooth the etched surface. The etched surface is mainly constructed {110} surfaces which are perpendicular to the Si(111) substrate constructing the hexagonal prism shape. The etchant used is ethylenediamine pyrocatechol and water. Using this Si structure as the mold, an array of hundreds of solid polymer dye microcavity laser are obtained at once. The lasing from the fabricated cavities is confirmed by sharp peaks in the emission spectrum.
一般社団法人日本機械学会の論文
2001-03-09