Ohdaira Toshiyuki | National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
スポンサーリンク
概要
関連著者
-
Ohdaira Toshiyuki
National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
-
Suzuki Ryoichi
National Institute Of Advanced Industrial Science And Technology
-
Ohdaira Toshiyuki
National Institute Of Advanced Industrial Science And Technology
-
Ohdaira Toshiyuki
National Institute Of Advanced Industrial Science And Technology (aist)
-
Uedono Akira
Institute of Applied Physics and Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba 305-8573, Japan
-
Suzuki R
National Institute Of Advanced Industrial Science And Technology
-
Ohshima Takeshi
Japan Atomic Energy Research Institute (jaeri)
-
Shioya Yoshimi
Semiconductor Process Laboratory Co. Ltd.
-
Ohgaki Takeshi
National Inst. For Materials Sci.
-
Ohshima T
Japan Atomic Energy Res. Inst. Takasaki Jpn
-
UEDONO Akira
Institute of Materials Science, University of Tsukuba
-
Uedono A
Univ. Tsukuba Tsukuba Jpn
-
ARIKADO Tsunetoshi
Semiconductor Leading Edge Technologies Inc.
-
MITSUHASHI Riichiro
Semiconductor Leading Edge Technologies, Inc.
-
SHIOYA Yoshimi
Semiconductor Process Laboratory Co., Ltd.
-
MAEDA Kazuo
Semiconductor Process Laboratory Co., Ltd.
-
SEINO Yutaka
National Institute of Advanced Industrial Science and Technology
-
MURAMATSU Makoto
National Institute of Advanced Industrial Science and Technology (AIST)
-
HIGUCHI Keiichi
Institute of Applied Physics, University of Tsukuba
-
SHIRAISHI Kenji
Nanomaterials Lab., National Institute for Materials Science
-
YAMADA Keisaku
Nanomaterials Lab., National Institute for Materials Science
-
Maeda Kazuo
Semiconductor Division Fujitsu Limited
-
MIKADO Tomohisa
Electrotechnical Laboratory
-
Uedono Akira
Institute Of Applied Physics University Of Tsukuba
-
Ueno Satoshi
Yokohama National Univ. Yokohama Jpn
-
Kaneko Hisashi
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
-
森 竜雄
Nagoya Univ. Aichi Jpn
-
TORII Kazuyoshi
Semiconductor Leading Edge Technologies, Inc.
-
YAMABE Kikuo
Institute of Applied Physics, University of Tsukuba
-
NISHIKAWA Satoshi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
-
KINOMURA Atsushi
National Institute of Advanced Industrial Science and Technology
-
Kamiyama Satoshi
Semiconductor Leading Edge Technologies Inc.
-
Kudo Jun
Semiconductor Technology Academic Research Center
-
HATTORI Nobuyoshi
Semiconductor Technology Academic Research Center
-
OGURA Atsushi
Semiconductor Technology Academic Research Center
-
MIKADO Tomohisa
National Institute of Advanced Industrial Science and Technology (AIST)
-
Kokubun Yasuo
Yokohama National Univ. Yokohama Jpn
-
AKASAKA Yasushi
Semiconductor Leading Edge Technologies Inc.
-
HORIUCHI Atsushi
Semiconductor Leading Edge Technologies, Inc.
-
KITAJIMA Hiroshi
Semiconductor Leading Edge Technologies, Inc.
-
Mikado Tomohisa
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
-
SHIMODA Haruo
Semiconductor Process Laboratory Co., Ltd.
-
ISHIMARU Tomomi
Canon Sales Co., Inc.
-
IKAKURA Hiroshi
Canon Sales Co., Inc.
-
MASUBUCHI Tomoaki
Canon Sales Co., Inc.
-
YAMABE Kikuo
Graduate School of Pure and Applied Sciences, University of Tsukuba
-
TANAKA Yasunori
National Institute of Advanced Industrial Science and Technology (AIST)
-
Yamamoto K
Kaneka Corporation
-
Miyazaki Seiichi
Department Of Electrical Engineering Graduate School Of Advanced Sciences And Matter Hiroshima Unive
-
Nishikawa Satoshi
Semiconductor Technology Academic Research Center
-
Nishikawa Satoshi
Semiconductor Tech. Lab. Oki Electric Industry Co. Ltd.
-
Umezawa Naoto
Advanced Electronic Materials Center National Institute For Materials Science
-
Arikado Tsunetoshi
Semiconductor Leading Edge Technologies Inc. (selete)
-
Mori K
Institute Of Material Science University Of Tsukuba
-
Torii Kazuyoshi
Semiconductor Leading Edge Technologies Inc.
-
GOTO Masakazu
Institute of Applied Physics, University of Tsukuba
-
Chikyow Toyohiro
Advanced Electronic Materials Center National Institute For Materials Science (nims)
-
Yamabe Kikuo
Institute Of Applied Physics University Of Tsukuba
-
Shimoda Haruo
Semiconductor Process Laboratory Co. Ltd.
-
Goto Masakazu
Institute Of Applied Physics University Of Tsukuba
-
Watanabe Heiji
Department Of Material And Life Science Graduate School Of Engineering Osaka University
-
Horiuchi Atsushi
Semiconductor Leading Edge Technologies Inc.
-
Ikakura Hiroshi
Canon Sales Co. Inc.
-
Harada Shinsuke
National Institute Of Advanced Industrial Science And Technology Power Electronics Research Center:u
-
FUKUDA Kenji
National Institute of Advanced Industrial Science and Technology, Power Electronics Research Center
-
Nara Yasuo
Semiconductor Leading Edge Technologies Inc.
-
Ishimaru Tomomi
Canon Sales Co. Inc.
-
Mikado T
Electrotechnical Laboratory
-
Masubuchi Tomoaki
Canon Sales Co. Inc.
-
OSHIMA Nagayasu
National Institute of Advanced Industrial Science and Technology (AIST)
-
Ito Kenichi
Graduate School Of Pure And Applied Sciences University Of Tsukuba
-
Shiraishi Kenji
Graduate School Of Applied Physics Univ Of Tsukuba
-
Muramatsu M
Institute Of Applied Physics University Of Tsukuba
-
Kitajima Hiroshi
Semiconductor Leading Edge Technologies Inc.
-
Maeda Kazuo
Semiconductor Process Laboratory Co. Ltd.
-
Ueno Satoshi
Yokohama National University, 79-5 Tokiwadai, Hodogayaku, Yokohama 240-8501, Japan
-
Tatewaki Takashi
Yokohama National University, 79-5 Tokiwadai, Hodogayaku, Yokohama 240-8501, Japan
-
Uedono Akira
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
-
Uedono Akira
Graduate School of Pure and Applied Science, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
-
Yamada Keisaku
Nano Technology Research Laboratory, Waseda University, Shinjuku, Tokyo 16-0041, Japan
-
Naito Tatsuya
Graduate School of Pure and Applied Science, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
-
Otsuka Takashi
Graduate School of Pure and Applied Science, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
-
Yamabe Kikuo
Graduate School of Pure and Applied Science, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
-
Yamada Keisaku
Nanomaterials Lab., National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan
-
Mori Kazuteru
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
-
Ito Kenichi
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
-
Imamizu Kentarou
Process and Manufacturing Engineering Center, Toshiba Co., Isogo-ku, Yokohama 235-8522, Japan
-
Hachiya Takayo
Process and Manufacturing Engineering Center, Toshiba Co., Isogo-ku, Yokohama 235-8522, Japan
-
Kamijo Hiroyuki
Process and Manufacturing Engineering Center, Toshiba Co., Isogo-ku, Yokohama 235-8522, Japan
-
Hasunuma Masahiko
Process and Manufacturing Engineering Center, Toshiba Co., Isogo-ku, Yokohama 235-8522, Japan
-
Toyoda Hiroshi
Process and Manufacturing Engineering Center, Toshiba Co., Isogo-ku, Yokohama 235-8522, Japan
-
Suzuki Ryouichi
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
-
Chikyow Toyohiro
Advanced Electric Materials Center, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
-
Shioya Yoshimi
Semiconductor Process Laboratory Co., Ltd., Apex Bldg. 4F, 717-30 Futamata, Ichikawa, Chiba 272-0001, Japan
-
Shioya Yoshimi
Semiconductor Process Laboratory Co., Ltd., Minory Bldg., 2012-4 Endo, Fujisawa, Kanagawa 252-0816, Japan
-
Akasaka Yasushi
Semiconductor Leading Edge Technologies, Inc., Tsukuba, Ibaraki 305-8569, Japan
-
Kinomura Atsushi
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
-
Kato Makoto
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
-
Kinoshita Akimasa
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
-
Higuchi Keiichi
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
-
Oshima Nagayasu
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
-
Fukuda Kenji
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
-
Mitsuhashi Riichiro
Semiconductor Leading Edge Technologies, Inc. (Selete), 34 Miyukigaoka, Tsukuba, Ibaraki 305-8501, Japan
-
Ohdaira Toshiyuki
National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
Ohdaira Toshiyuki
National Institute of Advanced Industrial Science and Technology, Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
Ohdaira Toshiyuki
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
-
Nakamura Tomoji
Semiconductor Technology Academic Research Center, 17-2 Shin Yokohama 3-chome, Kohoku, Yokohama 222-0033, Japan
-
Harada Shinsuke
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
-
Horiuchi Atsushi
Semiconductor Leading Edge Technologies, Inc. (Selete), 34 Miyukigaoka, Tsukuba, Ibaraki 305-8501, Japan
-
Suzuki Takashi
Semiconductor Technology Academic Research Center, 17-2 Shin Yokohama 3-chome, Kohoku, Yokohama 222-0033, Japan
-
Muramatsu Makoto
National Institute of Advanced Industrial Science and Technology, Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
Shiraishi Kenji
Graduate School of Pure and Applied Science, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
-
Kitajima Hiroshi
Semiconductor Leading Edge Technologies, Inc. (Selete), 34 Miyukigaoka, Tsukuba, Ibaraki 305-8501, Japan
-
Kokubun Yasuo
Yokohama National University, 79-5 Tokiwadai, Hodogayaku, Yokohama 240-8501, Japan
-
Kaneko Hisashi
Process and Manufacturing Engineering Center, Toshiba Co., Isogo-ku, Yokohama 235-8522, Japan
-
Miyazaki Seiichi
Department of Electrical Engineering, Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashi-Hiroshima, Hiroshima 739-8530, Japan
-
Miyazaki Seiichi
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
-
Torii Kazuyoshi
Semiconductor Leading Edge Technologies, Inc. (Selete), 34 Miyukigaoka, Tsukuba, Ibaraki 305-8501, Japan
-
Ito Kenichi
Graduate School of Pure and Applied Science, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
-
Yamabe Kikuo
Graduate School of Pure and Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
-
HORIUCHI Atsushi
Semiconductor Leading Edge Technologies
-
Kitajima Hiroshi
Semiconductor Leading Edge Technologies
-
MITSUHASHI Riichiro
Semiconductor Leading Edge Technologies
著作論文
- Reversal of UV Sensitivity and Loss Reduction of SiON Microring Resonator by Thermal Annealing
- Characterizing Metal-Oxide Semiconductor Structures Consisting of HfSiO_x as Gate Dielectrics using Monoenergetic Positron Beams
- Low-k SiOCH Film Deposited by Plasma-Enhanced Chemical Vapor Deposition Using Hexamethyldisiloxane and Water Vapor
- Properties of Low-k Cu Barrier SiOCNH Film Deposited by Plasma-Enhanced Chemical Vapor Deposition using Hexamethyldisiloxane and Ammonia Gases
- Fabrication of Microparticle Layer by Annealing Microparticle/Polymer Composite
- Characterization of Hf_Al_O_x Fabricated by Atomic-Layer-Deposition Technique Using Monoenergetic Positron Beams
- Positron Trapping Sites Originating from Oxide Interfaces on 4H-SiC C($000\bar{1}$)- and Si(0001)-Faces
- Reversal of UV Sensitivity and Loss Reduction of SiON Microring Resonator by Thermal Annealing
- Characterization of Hf0.3Al0.7Ox Fabricated by Atomic-Layer-Deposition Technique Using Monoenergetic Positron Beams
- Reemission of Positrons from Mesh and Powder Moderators
- Characterization of Metal/High-$k$ Structures Using Monoenergetic Positron Beams
- Low-$k$ SiOCH Film Deposited by Plasma-Enhanced Chemical Vapor Deposition Using Hexamethyldisiloxane and Water Vapor
- Impact of Residual Impurities on Annealing Properties of Vacancies in Electroplated Cu Studied Using Monoenergetic Positron Beams
- Defects in Electroplated Cu and Their Impact on Stress Migration Reliability Studied using Monoenergetic Positron Beams