ISHIMARU Tomomi | Canon Sales Co., Inc.
スポンサーリンク
概要
関連著者
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Ohdaira Toshiyuki
National Institute Of Advanced Industrial Science And Technology
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Suzuki R
National Institute Of Advanced Industrial Science And Technology
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Suzuki Ryoichi
National Institute Of Advanced Industrial Science And Technology
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SHIOYA Yoshimi
Semiconductor Process Laboratory Co., Ltd.
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ISHIMARU Tomomi
Canon Sales Co., Inc.
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Ohshima Takeshi
Japan Atomic Energy Research Institute (jaeri)
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Ohdaira Toshiyuki
National Institute Of Advanced Industrial Science And Technology (aist)
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Shioya Yoshimi
Semiconductor Process Laboratory Co. Ltd.
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Ohgaki Takeshi
National Inst. For Materials Sci.
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Ohshima T
Japan Atomic Energy Res. Inst. Takasaki Jpn
著作論文
- Properties of Low-k Cu Barrier SiOCNH Film Deposited by Plasma-Enhanced Chemical Vapor Deposition using Hexamethyldisiloxane and Ammonia Gases
- Pore Characteristics of Low-Dielectric-Constant Films Grown by Plasma-Enhanced Chemical Vapor Deposition Studied by Positron Annihilation Lifetime Spectroscopy : Instrumentation, Measurement, and Fabrication Technology