Shioya Yoshimi | Semiconductor Process Laboratory Co. Ltd.
スポンサーリンク
概要
関連著者
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Shioya Yoshimi
Semiconductor Process Laboratory Co. Ltd.
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Ohdaira Toshiyuki
National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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Suzuki Ryoichi
National Institute Of Advanced Industrial Science And Technology
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Ohdaira Toshiyuki
National Institute Of Advanced Industrial Science And Technology
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Suzuki R
National Institute Of Advanced Industrial Science And Technology
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SHIOYA Yoshimi
Semiconductor Process Laboratory Co., Ltd.
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ISHIMARU Tomomi
Canon Sales Co., Inc.
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Ohshima Takeshi
Japan Atomic Energy Research Institute (jaeri)
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Ohdaira Toshiyuki
National Institute Of Advanced Industrial Science And Technology (aist)
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Ohgaki Takeshi
National Inst. For Materials Sci.
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Ohshima T
Japan Atomic Energy Res. Inst. Takasaki Jpn
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Ishimaru Tomomi
Canon Sales Co. Inc.
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Maeda Kazuo
Semiconductor Division Fujitsu Limited
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SUZUKI Ryoichi
Electrotechnical Laboratory
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Ohdaira Toshiyuki
Department Of Nuclear Engineering Kyoto University
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Ueno Satoshi
Yokohama National Univ. Yokohama Jpn
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Kokubun Yasuo
Yokohama National Univ. Yokohama Jpn
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OHDAIRA Toshiyuki
Electrotechnical Laboratory
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MAEDA Kazuo
Semiconductor Process Laboratory Co., Ltd.
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SEINO Yutaka
National Institute of Advanced Industrial Science and Technology
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IKAKURA Hiroshi
Canon Sales Co., Inc.
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MASUBUCHI Tomoaki
Canon Sales Co., Inc.
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Shimoda Haruo
Semiconductor Process Laboratory Co. Ltd.
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Ikakura Hiroshi
Canon Sales Co. Inc.
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Ohgaki T
National Institute For Materials Science (nims)
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Masubuchi Tomoaki
Canon Sales Co. Inc.
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Maeda Kazuo
Semiconductor Process Laboratory Co. Ltd.
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Ueno Satoshi
Yokohama National University, 79-5 Tokiwadai, Hodogayaku, Yokohama 240-8501, Japan
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Tatewaki Takashi
Yokohama National University, 79-5 Tokiwadai, Hodogayaku, Yokohama 240-8501, Japan
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Shioya Yoshimi
Semiconductor Process Laboratory Co., Ltd., Apex Bldg. 4F, 717-30 Futamata, Ichikawa, Chiba 272-0001, Japan
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Shioya Yoshimi
Semiconductor Process Laboratory Co., Ltd., Minory Bldg., 2012-4 Endo, Fujisawa, Kanagawa 252-0816, Japan
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Kokubun Yasuo
Yokohama National University, 79-5 Tokiwadai, Hodogayaku, Yokohama 240-8501, Japan
著作論文
- Properties of Low-k Cu Barrier SiOCNH Film Deposited by Plasma-Enhanced Chemical Vapor Deposition using Hexamethyldisiloxane and Ammonia Gases
- Pore Characteristics of Low-Dielectric-Constant Films Grown by Plasma-Enhanced Chemical Vapor Deposition Studied by Positron Annihilation Lifetime Spectroscopy : Instrumentation, Measurement, and Fabrication Technology
- Reversal of UV Sensitivity and Loss Reduction of SiON Microring Resonator by Thermal Annealing
- Low-$k$ SiOCH Film Deposited by Plasma-Enhanced Chemical Vapor Deposition Using Hexamethyldisiloxane and Water Vapor