Low-k SiOCH Film Deposited by Plasma-Enhanced Chemical Vapor Deposition Using Hexamethyldisiloxane and Water Vapor
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-06-15
著者
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Ohdaira Toshiyuki
National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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Ohdaira Toshiyuki
National Institute Of Advanced Industrial Science And Technology
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Suzuki Ryoichi
National Institute Of Advanced Industrial Science And Technology
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SHIOYA Yoshimi
Semiconductor Process Laboratory Co., Ltd.
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SHIMODA Haruo
Semiconductor Process Laboratory Co., Ltd.
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MAEDA Kazuo
Semiconductor Process Laboratory Co., Ltd.
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SEINO Yutaka
National Institute of Advanced Industrial Science and Technology
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Ohdaira Toshiyuki
National Institute Of Advanced Industrial Science And Technology (aist)
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