Large-Displacement Micro-$XY$-Stage with Paired Moving Plates
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概要
- 論文の詳細を見る
An $XY$-stage driven by electrostatic comb drive actuators is fabricated realizing displacements of over 100 μm for both axes. The plates are prepared in one layer of the silicon-on-insulator (SOI) wafer and the actuators are prepared in another layer. The raster scanning of the plate is realized by maintaining orthogonal $x$- and $y$-movements. The fast scanning is along the $y$-axis. Paired $820 \times 950$-μm2-size media plates are driven at the mutually opposite $y$-directions canceling the inertial force. The static maximum displacements are 110 μm (geometrical limit) for the $x$-axis and 90 μm for the $y$-axis. At the resonance state, 115 μm (geometrical limit) is obtained for the $y$-axis.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-04-25
著者
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Hane Kazuhiro
Department Of Electronic Mechanical Engineering Faculty Of Engineering Nagoya University
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Sasaki Minoru
Department Of Acoustic Design Kyushu Institute Of Design
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Hane Kazuhiro
Department of Nanomechanics, Tohoku University, 6-6-01 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Bono Fuminori
Department of Nanomechanics, Tohoku University, 6-6-01 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Sasaki Minoru
Department of Advanced Science and Technology, Toyota Technological Institute, 2-12-1 Hisakata, Tenpaku-ku, Nagoya 468-8511, Japan
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