Subwavelength Antireflection Gratings for GaSb in Visible and Near-Infrared Wavelengths
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概要
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We fabricated a two-dimensional subwavelength grating (SWG) on a GaSb substrate. The SWG was patterned by electron-beam lithography and etched by a fast atom beam with SF6 and Cl2 gases. The SWG consisted of tapered gratings with a 350-nm-period and a 1280-nm-deep groove. The reflectivity at wavelengths from 500 nm to 2300 nm was measured and compared with the results calculated on the basis of rigorous coupled-wave analysis (RCWA). At wavelengths from 500 nm to 2000 nm, the SWG decreased the reflection as much as 5 to 10% from the original value of approximately 40% of the GaSb substrate. The thermal stability of the SWG was also studied by measuring the reflection spectra of heated samples.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-15
著者
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KANAMORI Yoshiaki
Department of Mechatronics and Precision Engineering, Tohoku University
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Yugami Hiroo
Department Of Mechanical Systems And Design Graduate School Of Engineering Tohoku University
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Yugami Hiroo
Department Of Mechatronics And Precision Engineering Tohoku University
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Hane Kazuhiro
Department Of Electronic Mechanical Engineering Faculty Of Engineering Nagoya University
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Kobayashi Ken-ichi
Department Of Applied Biology And Chemistry Tokyo University Of Agriculture
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Kobayashi Ken-ichi
Department Of Mechatronics And Precision Engineering Tohoku University
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Kanamori Yoshiaki
Department Of Machatronics And Precision Engineering Tohoku University
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