Guided-Mode Resonant Grating Filter Fabricated on Silicon-on-Insulator Substrate
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概要
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We propose a guided-mode resonant grating (GMRG) filter using silicon-on-insulator wafer. In the fabrication, electron beam lithography and fast atom beam etching are used. The periods of the three filters are 680, 700, and 720 nm, respectively. The reflectivity is measured to be nearly 100% at the wavelength of 1502 nm for the 700 nm period GMRG filter with a fill factor of 0.760. The optical properties of the filters are analyzed using a rigorous coupled-wave analysis (RCWA).
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-03-15
著者
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Hane Kazuhiro
Department Of Electronic Mechanical Engineering Faculty Of Engineering Nagoya University
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Kanamori Yoshiaki
Department Of Machatronics And Precision Engineering Tohoku University
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Hane Kazuhiro
Department of Nanomechanics, Tohoku University, 6-6-01 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Kitani Takashi
Department of Nanomechanics, Tohoku University, 6-6-01 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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