Double Twin Path Interferometer for Thin Film Thickness Measurement
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概要
- 論文の詳細を見る
A unique interferometer which can automatically measure the thickness of a film with a simultaneous reference level control is described. This is achieved by using a grating to split a laser beam into various orders. The interference between the diffracted components of the 0 and -1 orders is used to control the reference level and the interference between the diffracted components of there two orders gives a measurement of the film thickness. Theoretical calculations show a very good linearity and high precision. Aluminum films with thicknesses ranging from 700 to 3000 Å were measured with a precision of ±200 Å. Remedies for an improvement of the precision are discussed.
- 社団法人応用物理学会の論文
- 1986-07-20
著者
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Hane Kazuhiro
Department Of Mechatronics And Precision Engineering Tohoku University
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Chitnis Vijay
Department Of Electronics
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HATTORI Shuzo
Department of Electrical and Computer Engineering, Nagoya Institute of Technology
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UCHIDA Yoshiyuki
Department of Electrical Engineering, Aichi Institute of Technology, Toyota
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Hattori Shuzo
Department Of Electronic Mechanical Engineering Faculty Of Engineering Nagoya University
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Uchida Yoshiyuki
Department Of Electrical Engineering Aichi Institute Of Technology Toyota
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Uchida Yoshiyuki
Department Of Electronic Engineering Aichi Institute Of Technology
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Hane Kazuhiro
Department Of Electronic Mechanical Engineering Faculty Of Engineering Nagoya University
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YONEDA Katsumi
Department of Electrical Engineering, Faculty of Science and Technology, Meijyo University
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Yoneda Katsumi
Department Of Electrical Engineering Faculty Of Science And Technology Meijyo University
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Yoneda K
Ulsi Research Center Sanyo Electric Co. Lid.
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