Monolithic Integration Fabrication Process of Thermoelectric and Vibrational Devices for Microelectromechanical System Power Generator
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概要
- 論文の詳細を見る
This paper describes a fabrication process to integrate different types of energy-converting microelectromechanical system (MEMS) devices for a power generator. MEMS structures and a fabrication process for the monolithic integration are proposed for the purpose of accumulating small amounts of energy from various surrounding environments. For the MEMS power generator, thermocouples and movable plates are simultaneously fabricated in thick-film formation processes with deep reactive ion etching of silicon and gold electroplating. The fabricated thermoelectric devices of gold and silicon produced voltages in accordance with the temperature difference at the thermocouples. The vibrational devices with gold movable plates resonated with external vibrations. These results confirm that the monolithic integration process of MEMS devices can be established for harvesting thermal and vibrational energies from their surroundings.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-09-15
著者
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SAKATA Tomomi
NTT Microsystem Integration Laboratories
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ISHII Hiromu
NTT Microsystem Integration Laboratories
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MORIMURA Hiroki
NTT Microsystem Integration Laboratories
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KAMEI Toshikazu
NTT Advanced Technology Corp.
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KUDOU Kazuhisa
NTT Advanced Technology Corp.
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MACHIDA Katsuyuki
NTT Advanced Technology Corporation
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Sato Norio
Ntt Microsystem Integration Lab. Kanagawa Jpn
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Kuwabara Kei
Ntt Microsystem Integration Laboratories Ntt Corporation
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Terada Jun
Ntt Microsystem Integration Laboratories Ntt Corp.
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Ono Kazuyoshi
NTT Microsystem Integration Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Kuwabara Kei
NTT Microsystem Integration Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan
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Yano Masaki
NTT Advanced Technology Corp.
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Yano Masaki
NTT Advanced Technology Corporation, Atsugi, Kanagawa 243-0124, Japan
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Ishii Hiromu
NTT Microsystem Integration Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan
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Terada Jun
NTT Microsystem Integration Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan
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Machida Katsuyuki
NTT Advanced Technology Corp.
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Machida Katsuyuki
NTT Advanced Technology Corporation, Atsugi, Kanagawa 243-0124, Japan
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Morimura Hiroki
NTT Microsystem Integration Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan
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