Thick-Dielectric Formation and MOSFET Reliability with Spin-Coating Film Transfer and Hot-Pressing Technique for Seamless Integration Technology
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-04-30
著者
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Sato Norio
Ntt Corp. Kanagawa Jpn
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ISHII Hiromu
NTT Microsystem Integration Laboratories
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MACHIDA Katsuyuki
NTT Microsystem Integration Laboratories
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YANO Masaki
NTT Advanced Technology Corporation, NTT Corporation
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SATO Norio
NTT Microsystem Integration Labs.
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KAMEI Toshikazu
NTT Advanced Technology Corp.
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KUDOU Kazuhisa
NTT Advanced Technology Corp.
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SHIMOYAMA Nobuhiro
NTT Microsystem Integration Laboratories, NTT Corporation
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