Si Substrate Suitable for Radiation-Resistant Space Solar Cells
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概要
- 論文の詳細を見る
Irradiating group-III (B, Al, Ga)-doped Czochralski (CZ)-grown Si substrates as well as B-doped magnetic Czochralski (MCZ)-grown and floating-zone (FZ)-grown Si substrates with 10 MeV protons or 1 MeV electrons, we investigate both the reduction in the hole concentration and the conversion of p type to n type using Hall-effect measurements. In all the 10 $\Omega$ cm CZ-Si, the density of each acceptor species is reduced by irradiation, and finally the conversion occurs with $10^{17}$ cm-2 fluence of 1 MeV electrons or with $2.5\times 10^{14}$ cm-2 fluence of 10 MeV protons. In 10 $\Omega$ cm MCZ-Si and 10 $\Omega$ cm FZ-Si, on the other hand, the conversion does not occur under the same conditions. Moreover, the reduction in the hole concentration for the FZ-Si is much less than the others. From these results, it is elucidated that the conversion as well as the reduction in the hole concentration is strongly dependent on the concentration of oxygen in Si, not on the type of acceptor species in Si. Therefore, the p-type FZ-Si substrate is appropriate for radiation-resistant space solar cells such as n+/p/p+ Si solar cells and upcoming III–V tandem solar cells on n+/p Si substrates.
- 2006-04-15
著者
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Itoh Hisayoshi
Japan Atomic Energy Agency
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Imai Hideaki
Department Of Electronic And Information Engineering Faculty Of Engineering Hokkaido University
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Inoue Yuuki
Department Of Preventive Veterinary Medicine And Animal Health Nihon University School Of Veterinary
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Ohshima Takeshi
Japan Atomic Energy Agency
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Matsuura Hideharu
Department Of Electronic Engineering And Computer Science Osaka Electro-communication University
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Kawakita Shirou
Japan Aerospace Exploration Agency, 2-1-1 Sengen, Tsukuba, Ibaraki 305-8505, Japan
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Kawakita Shirou
Japan Aerospace Exploration Agency (JAXA), 2-1-1 Sengen, Tsukuba, Ibaraki 305-8505, Japan
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Imai Hideaki
Department of Electronic Engineering and Computer Science, Osaka Electro-Communication University, 18-8 Hatsu-cho, Neyagawa, Osaka 572-8530, Japan
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Iwata Hirofumi
Department of Electronic Engineering and Computer Science, Osaka Electro-Communication University, 18-8 Hatsu-cho, Neyagawa, Osaka 572-8530, Japan
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Kagamihara Sou
Department of Electronic Engineering and Computer Science, Osaka Electro-Communication University, 18-8 Hatsu-cho, Neyagawa, Osaka 572-8530, Japan
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Ishihara Ryohei
Department of Electronic Engineering and Computer Science, Osaka Electro-Communication University, 18-8 Hatsu-cho, Neyagawa, Osaka 572-8530, Japan
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Komeda Masahiko
Department of Electronic Engineering and Computer Science, Osaka Electro-Communication University, 18-8 Hatsu-cho, Neyagawa, Osaka 572-8530, Japan
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Kikuta Masanori
Department of Electronic Engineering and Computer Science, Osaka Electro-Communication University, 18-8 Hatsu-cho, Neyagawa, Osaka 572-8530, Japan
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Hisamatsu Tadashi
Sharp Corporation, 492 Minosho-cho, Yamato-Koriyama, Nara 639-1186, Japan
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Itoh Hisayoshi
Japan Atomic Energy Agency, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan
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Inoue Yuuki
Department of Electronic Engineering and Computer Science, Osaka Electro-Communication University, 18-8 Hatsu-cho, Neyagawa, Osaka 572-8530, Japan
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Ohshima Takeshi
Japan Atomic Energy Agency, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan
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Imai Hideaki
Department of Applied Chemistry, Faculty of Engineering, Nagoya University
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