Effect of Substrate Surface Phase on the Shape of Self-Organized Al Nanoclusters on Si(100) Formed upon Atomic Hydrogen Exposure
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概要
- 論文の詳細を見る
The self-organized formation of Al nanoclusters induced by atomic hydrogen exposure of the Si(100)$2\times 2$-Al and $c(4\times 12)$-Al surfaces has been studied using scanning tunneling microscopy. The shape of the Al nanoclusters formed has been found to crucially depend on the structure of the initial surface. Although Al nanoclusters on the $2\times 2$-Al surface have an irregular spherical-like shape, the clusters formed on the $c(4\times 12)$-Al surface display a regular shape of hutlike crystallites bounded by {111} and {100} facets. This result demonstrates a method of controlling the shape of the self-organized nanoclusters.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-04-15
著者
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ZOTOV Andrey
Department of Electronic Engineering, Faculty of Engineering, Osaka University
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Saranin Alexander
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Itou Sukenori
Department Of Electronic Engineering Graduate School Of Engineering Osaka University
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Oura Kenjiro
Department Of Elecronic Engineering Graduate School Of Engineering Osaka University
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Nishida Atsushi
Department Of Chemical System Engineering The University Of Tokyo
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Yamaoka Nobumitsu
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Kubo Osamu
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Itou Sukenori
Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Katayama Mitsuhiro
Department of Elecronic Engineering, Graduate School of Engineering, Osaka University
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Katayama Mitsuhiro
Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Zotov Andrey
Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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