Local Etching of Insulator-Coated Carbon Nanotubes towards Passivated Nanoprobes
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概要
- 論文の詳細を見る
We present a method for local etching of the tip region of insulator-coated carbon nanotubes (CNTs) towards passivated nanoprobes. By reactive ion etching (RIE), a 20-nm-thick SiO2 layer, which was uniformly wrapped around vertically oriented CNTs, was selectively removed from the tip, maintaining the crystallinity of inner CNT. It was found that the length of exposed CNT is controlled via etching time at an etching rate of 16 nm/min. This local etching was achieved by RIE using CF4 as an etchant, and photoresist as a passivation mask.
- 2004-07-15
著者
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Honda Shin-ichi
Department Of Electronic Engineering Graduate School Of Engineering Osaka University
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Katayama Mitsuhiro
Department Of Electronic Engineering Graduate School Of Engineering Osaka University
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Ikuno Takashi
Department Of Electric Engineering Graduate School Of Engineering Osaka University
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LEE Kuei-Yi
Research Center for Ultrahigh Voltage Electron Microscopy, Osaka University
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Lee Jung-goo
Research Center For Ultra-high Voltage Electron Microscopy Osaka University
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Mori Hirotaro
Research Center For Ultra-high Voltage Electron Microscopy Osaka University
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Oura Kenjiro
Department Of Elecronic Engineering Graduate School Of Engineering Osaka University
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Kuzuoka Takashi
Department Of Electronic Engineering Graduate School Of Engineering Osaka University
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Kuzuoka Takashi
Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Oura Kenjiro
Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Lee Kuei-Yi
Research Center for Ultrahigh Voltage Electron Microscopy, Osaka University, 7-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Katayama Mitsuhiro
Department of Elecronic Engineering, Graduate School of Engineering, Osaka University
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