Synthesis of Metal-Alloy-Coated Nanowires toward Functional Scanning Probe Microscope
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概要
- 論文の詳細を見る
Using carbon nanotubes (CNTs) as templates, we have fabricated metal-alloy-coated nanowires by pulsed laser deposition. Superconducting and ferromagnetic materials were uniformly deposited around an isolated multiwalled CNT (MWNT), and reflected the shape of the MWNT. It was found that Nb3Sn and CoFe layers were deposited at a rate of about 0.13 nm/min, which indicates that their film thicknesses can be accurately controlled with nanometer accuracy. We also fabricated a superconductor-coated W tip, and obtained an scanning tunneling microscopy (STM) image of the Au(111) reconstructed surface at 2 K. These results indicate that nanowires synthesized using CNT templates can be used as materials for the tips of a functional scanning probe microscopy (SPM) which provide the nanoscale proximity of superconducting or magnetic nanowires.
- 2006-04-30
著者
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Honda Shin-ichi
Department Of Electronic Engineering Graduate School Of Engineering Osaka University
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Katayama Mitsuhiro
Department Of Electronic Engineering Graduate School Of Engineering Osaka University
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OURA Kenjiro
Research Center for Ultrahigh Voltage Electron Microscopy, Osaka University
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YOSHIMOTO Shinya
Department of Physics, School of Science, University of Tokyo
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MURATA Yuya
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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HOBARA Rei
Department of Physics, School of Science, University of Tokyo
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KISHIDA Masaru
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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KONISHI Hirofumi
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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YASUDA Tatsuro
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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Hasegawa Shuji
Department Of Physics Faculty Of Science University Of Tokyo:(present Adress) Advanced Research Labo
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Tomita Kazuhiro
Department Of Engineering Science Nagoya Institute Of Technology
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Lee Jung-goo
Research Center For Ultra-high Voltage Electron Microscopy Osaka University
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Matsuda Iwao
Department Of Physics School Of Science University Of Tokyo
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Mori Hirotaro
Research Center For Ultra-high Voltage Electron Microscopy Osaka University
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Maeda Daisuke
Department Of Aeronautics And Astronautics Graduate School Of Engineering The University Of Tokyo
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Motoyoshi Kenji
Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Oura Kenjiro
Research Center for Ultra High Voltage Electron Microscopy, Osaka University, 7-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Tomita Kazuhiro
Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Konishi Hirofumi
Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Oura Kenjiro
Research Center for Ultra-High Voltage Electron Microscopy, Osaka University, 7-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Kishida Masaru
Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Katayama Mitsuhiro
Department of Elecronic Engineering, Graduate School of Engineering, Osaka University
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Lee Jung-Goo
Research Center for Ultra-High Voltage Electron Microscopy, Osaka University, 7-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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