Substrate-Structure Dependence of Ag Electromigration on Au-Precovered Si(111) Surfaces
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概要
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Electromigration of Ag on Au-precovered Si(111) surfaces was investigated by in-situ ultrahigh vacuum scanning electron microscopy and μ-probe reflection-high-energy electron diffraction (RHEED). Migration behaviors of a Ag-film patch strongly depended on Au coverage θ_<Au> and corresponding surface structures. When θ_<Au> < 0.7 monolayer (ML), the patch expanded preferentially towards the cathode to attain a maximum area in which the sum of Ag and Au coverages were always about 1 ML irrespective of θ_<Au>resulting in two-dimensional (2D) alloy phases (showing √<3> × √<3>RHEED patterns) with different Au/Ag concentration ratios. The largest expansion of the patch area was achieved on a (5 × 2 + α-√<3>×√<3>)-Au mixed phase structure (θ_<Au> 〜 0.7 ML). However, when θ_<Au> > 0.7 ML, the patch expansion was greatly reduced. Especially on the β-√<3> × √<3>-Au surface (θ_<Au> 〜 1.0 ML), The patch showed no directional expansion towards the cathode. But Ag atoms were observed to migrate inside the patches on all substrates (including the β-√<3> × √<3>-Au surface) to form 3D islands near terrace edges.
- 社団法人応用物理学会の論文
- 2000-07-30
著者
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SHIRAKI Ichiro
Department of Physics, University of Tokyo
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Hasegawa Shuji
Department Of Physics Faculty Of Science University Of Tokyo:(present Adress) Advanced Research Labo
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Nagao T
Department Of Physics University Of Tokyo:core Research For Evolutional Science And Technology Japan
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Nagao Tadaaki
Department Of Physics Graduate School Of Science University Of Tokyo. Core Research For Evolutional
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Shiraki Ichiro
Department Of Physics University Of Tokyo
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SHI Fangxiao
Department of Physics, University of Tokyo
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Shi Fangxiao
Department Of Physics University Of Tokyo:core Research For Evolutional Science And Technology Japan
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