Fermi-Level Tuning of Topological Insulator Thin Films

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Topological insulators are insulating materials but have metallic edge states with peculiar properties. They are considered to be promising for the development of future low energy consumption nano-electronic devices. However, there is a major problem: Naturally grown materials are not truly insulating owing to defects in their crystal structure. In the present study, we have examined the electronic structure and transport properties of topological insulator ultrathin Bi<inf>2</inf>Te<inf>3</inf>films by angle-resolved photoemission spectroscopy and in situ transport measurements. To realize a truly bulk insulating film, we tried to tune the Fermi-level position using two methods. The first of these, i.e., changing the Si substrate temperature during film growth (350--450 K) to reduce the defects in the grown films, had some effect in reducing the bulk residual carriers, but we could not fabricate a film that showed only the surface states crossing the Fermi level. The second method we employed was to incorporate Pb atoms during film growth since Pb has one less electron than Bi. When the films were grown at around 350 K, we observed a systematic shift in the Fermi level and obtained a bulk insulating film, although it was not possible to move the Dirac point just at the Fermi level. The change in the measured film conductivity was consistent with the shift in the Fermi level and suggested the detection of the surface-state conductivity. For films grown at a higher substrate temperature (450 K), the Fermi level could be tuned only slightly and a bulk n-type film was obtained. Pb incorporation changes the shape of the Dirac cone, suggesting the formation of a stoichiometric ternary alloy of Bi, Pb, and Te, which is another topological insulator.
2013-11-25

Fermi-Level Tuning of Topological Insulator Thin Films

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