Depth Profiling of Oxygen Concentration of Indium Tin Oxide Films Fabricated by Reactive Sputtering

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-09-01

著者

• OURA Kenjiro

  Department of Electronic Engineering, Graduate School of Engineering, Osaka University

• Honda Shin‐ichi

  Osaka Univ. Osaka Jpn

• Oura K

  Research Center For Ultrahigh Voltage Electron Microscopy Osaka University

• Oura Kenjiro

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• HONDA Shinichi

  Department of Electric Engineering, Graduate School of Engineering, Osaka University

• Honda Shinichi

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• TSUJIMOTO Akira

  Department of Electronic Engineering, Faculty of Engineering, Osaka University

• WATAMORI Michio

  Department of Electronic Engineering, Faculty of Engineering, Osaka University

• Honda S

  Nihon Univ. Koriyama Jpn

• Oura Kenjiro

  Department Of Elecronic Engineering Graduate School Of Engineering Osaka University

• Tsujimoto A

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Honda Shin-ichi

  Division Of Electrical Electronic And Information Engineering Graduate School Of Engineering Osaka U

• Watamori Michio

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Honda Shini-ichi

  Department Of Electronic Engineering Graduate School Of Engineering Osaka University

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