Fabrication and Characteristics of Amorphous Carbon Films Grown in Pure Methane Plasma by using Radio Frequency Plasma Enhanced Chemical Vapor Deposition

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-04-15

著者

• Hirao T

  Osaka Univ. Osaka Jpn

• HONDA Shin-ichi

  Department of Electronic Engineering, Graduate School of Engineering, Osaka University

• IKUNO Takashi

  Department of Electronic Engineering, Graduate School of Engineering, Osaka University

• KATAYAMA Mitsuhiro

  Department of Electronic Engineering, Graduate School of Engineering, Osaka University

• HIRAO Takashi

  Department of Electrical Engineering, Graduate School of Engineering, Osaka University

• OURA Kenjiro

  Department of Electronic Engineering, Graduate School of Engineering, Osaka University

• Takashi Ikuno

  Department Of Electric Engineering Graduate School Of Engineering Osaka University

• RYU Jeong-Tak

  Department of Computer and Communication Engineering Taegu University

• CHO Kyung-Jae

  Center for Laboratory Facilities, Daegu University

• BAEK Yang-Gyu

  Department of Electronic Engineering, Faculty of Engineering, Osaka University

• Ryu J‐t

  Taegu Univ. Kyungpook Kor

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