Oura Kenjiro | Department Of Electronic Engineering Faculty Of Engineering Osaka University

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概要

• 同名の論文著者
• Department Of Electronic Engineering Faculty Of Engineering Osaka Universityの論文著者

関連著者

• OURA Kenjiro

  Department of Electronic Engineering, Graduate School of Engineering, Osaka University

• Oura Kenjiro

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Oura Kenjiro

  Department Of Elecronic Engineering Graduate School Of Engineering Osaka University

• Honda Shin‐ichi

  Osaka Univ. Osaka Jpn

• Oura K

  Research Center For Ultrahigh Voltage Electron Microscopy Osaka University

• HONDA Shinichi

  Department of Electric Engineering, Graduate School of Engineering, Osaka University

• Honda Shinichi

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• TSUJIMOTO Akira

  Department of Electronic Engineering, Faculty of Engineering, Osaka University

• WATAMORI Michio

  Department of Electronic Engineering, Faculty of Engineering, Osaka University

• Honda S

  Nihon Univ. Koriyama Jpn

• Tsujimoto A

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Honda Shin-ichi

  Division Of Electrical Electronic And Information Engineering Graduate School Of Engineering Osaka U

• Watamori Michio

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Honda Shini-ichi

  Department Of Electronic Engineering Graduate School Of Engineering Osaka University

• Shoji Fumiya

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Shoji Fumiya

  Department Of Applied Physics Faculty Of Engineering Kobe University

• NAITOH Masamichi

  Department of Electrical Engineering, Kyushu Institute of Technology

• Naitoh M

  Kyushu Inst. Technol. Kitakyushu Jpn

• Naitoh Masamichi

  Department Of Electrical Engineering Kyushu Institute Of Technology

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著作論文

• Effects of Post-Annealing on Oxygen Content of Indium Tin Oxide Films Fabricated by Reactive Sputtering
• Depth Profiling of Oxygen Concentration of Indium Tin Oxide Films Fabricated by Reactive Sputtering
• Direct Observation of the Growth Process of Ag Thin Film on a Hydrogen-Terminated Si(111) Surface

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