Effect of Substrate Surface Phase on the Shape of Self-Organized Al Nanoclusters on Si(100) Formed upon Atomic Hydrogen Exposure

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概要

• 論文の詳細を見る

• The self-organized formation of Al nanoclusters induced by atomic hydrogen exposure of the Si(100)$2\times 2$-Al and $c(4\times 12)$-Al surfaces has been studied using scanning tunneling microscopy. The shape of the Al nanoclusters formed has been found to crucially depend on the structure of the initial surface. Although Al nanoclusters on the $2\times 2$-Al surface have an irregular spherical-like shape, the clusters formed on the $c(4\times 12)$-Al surface display a regular shape of hutlike crystallites bounded by {111} and {100} facets. This result demonstrates a method of controlling the shape of the self-organized nanoclusters.

• 公益社団法人 応用物理学会の論文
• 2003-04-15

著者

• ZOTOV Andrey

  Department of Electronic Engineering, Faculty of Engineering, Osaka University

• Saranin Alexander

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Itou Sukenori

  Department Of Electronic Engineering Graduate School Of Engineering Osaka University

• Oura Kenjiro

  Department Of Elecronic Engineering Graduate School Of Engineering Osaka University

• Nishida Atsushi

  Department Of Chemical System Engineering The University Of Tokyo

• Yamaoka Nobumitsu

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Kubo Osamu

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Katayama Mitsuhiro

  Department of Elecronic Engineering, Graduate School of Engineering, Osaka University

• Zotov Andrey

  Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan

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