5503 ナイフ形状プローブを用いた有機レジストのパターニング(J19-1 マイクロメカトロニクス(1),J19 マイクロメカトロニクス)

概要

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This report describes results of resist patterning using a knife edge probe we have developed recently. Nano patterning using atomic force microscope is usually done by field assisted oxidation technique. This method provides very small patterning but patterned layer is very thin and limited for only oxidizable materials. Therefore we applied for resist patterning directly by AFM using the knife edge probe. The patterning was done by tapping mode of AFM which carve a photo resist. The fabricated pattern was then transformed to aluminum under layer which is used as a mask for ICP RIE. Using this method we have obtained very small trench structure in width of 430nm.
一般社団法人日本機械学会の論文
2006-09-15