Effect of bottom electrode structure on electrical properties of BaTiO3 thin films fabricated by CSD method
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概要
- 論文の詳細を見る
BaTiO3 (BT) based perovskite films are expected as ferroelectric and piezoelectric materials alternating Pb(Zr,Ti)O3 (PZT) films which involve toxicity of the lead. In the present study, we focus effects of bottom electrode structures on electrical properties of the BT films fabricated by Chemical Solution Deposition (CSD) method. The BT films were fabricated on 1–6 layered LaNiO3 (LNO) bottom electrode on Si or Pt/Ti/SiO2/Si substrate. The dielectric constant of the BT films fabricated on LNO/Pt/Ti/SiO2/Si substrate showed higher values than that on the LNO/Si substrate. The dielectric constant and piezoelectric properties increased with increasing layer numbers of the LNO. The microstructure and crystal structure of the BT films was studied by means of X-ray diffraction, scanning electron microscopy (SEM), and scanning transmission electron microscopy (STEM).
著者
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SUZUKI Toshimasa
Taiyo Yuden Co., Ltd.,
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WAKIYA Naoki
Department of Materials Science and Chemical Engineering, Shizuoka University
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SAKAMOTO Naonori
Department of Materials Science and Chemical Engineering, Shizuoka University
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Suzuki Hisao
Graduate School Of Science And Technology Shizuoka University
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YOSHIOKA Haruna
Department of Materials Science and Chemical Engineering, Shizuoka University
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SUZUKI Junpei
Taiyo Yuden Co Ltd, R&D Center
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Suzuki Hisao
Graduate School Of Sci. And Technol. Shizuoka Univ.
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Wakiya Naoki
Department Of Materials Science And Chemical Engineering Shizuoka University
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SUZUKI Toshimasa
Taiyo Yuden Co Ltd, R&D Center
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SUZUKI Junpei
Taiyo Yuden Co Ltd, R&D Center
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